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Ion beam etch and deposition systems
Oxford Instruments offers a single tool, allowing the flexibility to perform etch and/or deposition and maximising system utilisation. System specifications can be closely tuned to applications, enabling faster and repeatable process results.
The Oxford Instruments Ion Beam range offers functionality in multiple modes:
- Ion Beam Etching (IBE)
- Reactive Ion Beam Etching (RIBE)
- Chemical Assisted Ion Beam Etching (CAIBE)
- Ion Beam Sputter Deposition (IBSD)
- Ion Assisted Sputter Deposition (IASD)
Oxford Instruments’ systems are scalable from R&D to batch production in one tool.
The Ion Beam Range
Etch and deposition processes in one tool
Optofab3000
Purpose made system for optical coatings
Ionfab500Plus
Specialist high precision ion beam deposition system
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